Products
連續臥式濺鍍機/ In Line Sputtering System
In Line Sputter量產型設備，備多種生產規格與客製化開發。亦適用各種不同元件製程。Our In Line Sputtering equipment in accordance with customer specification & process to design to meet the different components process.
*應用於被動元件產業/陶瓷散熱基板/鍍膜。Applied to the passive component industry/Ceramic heat sink Substrate/Sputtering.
*應用於各類金屬與非金屬鍍膜。Applied to the various kinds metals and non-metals.
* 應用於用於抗電磁波(EMI)、產品裝飾膜(NCVM)、觸控螢幕(T.P)、彩色濾光片(C.F)、顯示器(TFT;OLED)、薄膜太陽能電池(Solar cell)。Applied to the EMI, NCVM, T.P, C.F, TFT, OLED, Solar cell.多腔連續式，包含垂直/水平兩種設計方式。In Line multi-chamber sputtering, Include Vertical / horizontal type.
連續式生產，搭配自動回流線設計，產量大。Continuous production with automatic return line design and large output.
可設計純金屬濺鍍、反應式濺鍍、混合式濺鍍、表面清潔等多種製程搭配。Design can use for multi-process of Metal / Reaction sputtering / Blended type sputtering / Surface clean sputtering.
人性化操作介面，高靶材利用率，高設備稼動率。Humanized operation interface / High target utilization rate / High equipment utilization rate.
可依客戶需求產量訂製機台產出與稼動。Machine output and operation can be customized according to customer demand.
圓桶式濺鍍機/Multi-Function
本設備滿足用於量產片式電阻端導電極生產。
The equipment is suitable for mass production of chip resistance terminal conductive electrodes.
應用於被動元件產業/陶瓷散熱基板/鍍膜
Applied to passive component industry/ceramic
heat sink substrate/sputtering
應用於各類非磁性金屬與分金屬鍍膜
Applied to all kinds of non-magnetic metal and
sub-metal coating
功能性設計，可滿足不同制程多樣化之需求
Functional design to meet the diverse needs of
different manufacturing processes
高自動化、抽氣速率快，可配合需求生產電阻端導電極
High automation, fast pumping rate, can meet the
demand to produce resistance terminal conductive
electrode
保養周期長，連續生產無需保養受環境影響小，無停機後重啟時間上等問題
Long maintenance period, continuous production
without maintenance and not environmental
impact and no any issue such as high restart time
after shutdown machine.
強大的數據處理功能，可與現場ERP連接使用
Powerful data processing function and which
can be connected with on-site ERP.
小型蒸鍍機/ Physical vapor deposition (PVD)
本設備可應用於，光學薄膜、半導體膜、絶緣膜、螢幕表面、裝飾表面用的塗層、電子零件、食品包裝材料等。 設備單價較便宜、鍍膜速度較快，氧化物及氟化物鍍膜材料較便宜、曲面工件鍍膜均勻性優，鍍多層膜純度佳。
